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Lithographic approaches require very clean environments because particulates and dust can mask part of the exposed area For high yields, clean rooms must have particulate densities that are extremely low and at sizes much smaller than the lithographic minimum feature size These requirements imply that the cost of lithography is nontrivial, and it increases rapidly as the feature size decreases and may eventually slow down the progress of microelectronics Self-assembly approaches attempt to address these limiting issues In a bottom-up technique the devices self-assemble into circuits; if successful, these techniques will be substantially cheaper than lithographic techniques This work, however, is at a relatively early stage of research In the late 1990s and early 2000s, a number of biological, organic, and inorganic systems have been shown to be able to self-assemble Examples of documented self-assembly include Langmuir Blogett lms, S-bacterial layers, self-assembled monolayers, and antibody antigen recognition.

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Much of this self-assembly, however, has been in the area of metallic and semiconductor dots that have some optoelectronic properties for detectors, light-emitting diodes (LEDs), and lasers Most of these approaches are not appropriate for electronic systems because no interconnects are available In conclusion, these techniques are still at a very early stage, and substantial research is required to get any of the techniques to a manufacturing level for computing and telecom applications We make some passing comments on optics as we wrap up this chapter in the context of the desire to develop integrated optoelectronic devices Compared with groups III V semiconductors (eg, GaAs and InAs), silicon is a poor material for optical components due to the indirect bandgap.

where terms higher than rst order can be neglected if M is suf ciently close to 1 and a small region is examined Note that this error is similar to a radial shear When the CGH is plotted, alignment aids, which can help in obtaining the proper hologram size, must be drawn on the hologram plot The largest source of error is distortion in the hologram plotter (Wyant et al, 1974) The CGH wavefront accuracy depends on the number of plotter resolution points and the maximum slope of the aspheric wavefront being tested Assuming that the plotter has P P resolution points, there are P=2 resolution points across the radius of the hologram Since the maximum error in plotting any point is half a resolution unit, any portion of each line making up the hologram can be displaced by a distance equal to 1=P.

4.4.4 Post-Translational Modi cation Analysis of Proteins The post-translational modi cations summarized in Figure 4.26 and Table 4.3 are important to protein function because they may be implicated in processes such as protein activation/inactivation (e.g. protein phosphorylation in signal transduction cascades involving G-proteins), recognition (e.g. glycosylation of receptors) or proteolysis (e.g. protein turnover). Chemical procedures for analysis of individual modi cations such as glycosylation, acylation or phosphorylation exist. However, these techniques are laborious and only give information about a particular type of modi cation. The observation that all of the post-translational modi cations of proteins result in altered mass makes MS particularly suitable for their analysis. MS analysis of Oglyosylation is described in Example 4.4.

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If the maximum difference between the slope of the test wavefront and the tilted plane wave is 4S waves per hologram radius, the phase of the plane wave at the hologram lines can differ from that of the required wavefront at the same lines by as much as 4S=P waves (1980) The maximum error in the reconstructed wavefront will be 4S=P waves, and since the nal interferogram is recorded in the image plane of the hologram, the quantization due to the nite number of resolution points causes a peak error in the nal interferogram of 4S=P waves It is important to note that the peak wavefront error of 4S=P waves is really a worst-case situation; it occurs only if, in the region of the hologram where the slope difference is maximum, the plotter distortion is also a maximum.

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